MOCVD Precursors (13)

REAGENT

Hafnium chloride

99.99%, white powder, zirconium ≤0.15%

CAS:13499-05-3

Formula:Cl₄Hf

MW:320.30 g/mol

฿2,690.00

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REAGENT

hafnium tetrachloride

99.9%, particle, zirconium ≤0.15%

CAS:13499-05-3

Formula:Cl₄Hf

MW:320.30 g/mol

฿2,180.00

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REAGENT

Hafnium(IV) dichloride oxide octahydrate

98% trace metals basis excluding Zr

CAS:14456-34-9

Formula:Cl₂HfO·₈H₂O

MW:409.52(265.40anhy) g/mol

฿2,400.00

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REAGENT

Hafnium(IV) ethoxide

99.9% (metals basis)

CAS:13428-80-3

Formula:Hf(OC₂H₅)₄

MW:358.73 g/mol

฿11,190.00

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REAGENT

Hafnium chloride

99.5%

CAS:13499-05-3

Formula:Cl₄Hf

MW:320.30 g/mol

฿600.00

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REAGENT

Hafnium(IV) fluoride

99.9% metals basis

CAS:13709-52-9

Formula:HfF₄

MW:254.48 g/mol

฿7,150.00

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REAGENT

HAFNIUM N-BUTOXIDE

60% in n-butoxide, Hf: 22.6 wt%

CAS:22411-22-9

Formula:C₁₆H₃₆HfO₄

MW:470.94 g/mol

฿9,420.00

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REAGENT

Hexamethyldigermanium(IV)

97%

CAS:993-52-2

Formula:C₆H₁₈Ge₂

MW:235.487 g/mol

฿52,560.00

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REAGENT

Hafnium dimethylamide

97%

CAS:19962-11-9

Formula:C₈H₂₄HfN₄

MW:354.793 g/mol

฿31,550.00

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REAGENT

Germanium n-butoxide

97%

CAS:25063-27-8

Formula:C₁₆H₃₆GeO₄

MW:365.05 g/mol

฿5,260.00

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