Used in the production of hafnium metal and as a precursor in chemical vapor deposition (CVD) processes to create hafnium-containing thin films for semiconductor devices. Plays a role in catalysis for certain organic reactions. Also utilized in the development of high-k dielectric materials in advanced microelectronics due to hafnium oxide's favorable insulating properties. Investigated for use in nuclear reactor control rods, leveraging hafnium’s high neutron absorption capability when derived into functional materials.