Used primarily in the semiconductor industry as a precursor for depositing germanium-containing thin films through chemical vapor deposition (CVD) processes. Its high volatility and thermal stability make it suitable for creating high-purity germanium layers, which are essential in advanced electronic devices, photodetectors, and infrared optics. It also serves as a reagent in organometallic synthesis for developing new germanium-based materials with potential applications in optoelectronics and nanotechnology.