MOCVD Precursors (6)

REAGENT

Tantalum(V) butoxide

99%

CAS:51094-78-1

Formula:Ta(OCH₂CH₂CH₂CH₃)₅

MW:546.52 g/mol

฿2,450.00

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REAGENT

Trimethyl(methylcyclopentadienyl)platinum(IV)

99%

CAS:94442-22-5

Formula:C₅H₄CH₃Pt(CH₃)₃

MW:319.3 g/mol

฿990.00

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REAGENT

(2,2,6,6-Tetramethyl-3,5-heptanedionato)copper(II)

98%

CAS:14040-05-2

Formula:C₂₂H₃₈CuO₄

MW:430.08 g/mol

฿2,200.00

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REAGENT

Tetrakis(dimethylamido)hafnium

99.99%

CAS:19782-68-4

Formula:C₈H₂₄HfN₄

MW:354.79 g/mol

฿9,160.00

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REAGENT

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)titanium(III)

97%

CAS:181418-64-4

Formula:C₃₃H₅₇O₆Ti

MW:597.70 g/mol

฿4,990.00

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REAGENT

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)holmium(III)

97%

CAS:15522-73-3

Formula:C₃₃H₅₇HoO₆

MW:714.73 g/mol

฿3,650.00

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REAGENT

Trimethyl(methylcyclopentadienyl)platinum(IV)

99.9%

CAS:94442-22-5

Formula:C₅H₄CH₃Pt(CH₃)₃

MW:319.3 g/mol

฿9,000.00

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REAGENT

Tetrakis(dimethylamino)zirconium

Electronic grade, ≥99.99% trace metals basis

CAS:19756-04-8

Formula:C₈H₂₄N₄Zr

MW:267.53 g/mol

฿4,350.00

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REAGENT

Triisopropylchlorogermane

97%

CAS:2816-54-8

Formula:C₉H₂₁ClGe

MW:237.356 g/mol

฿54,490.00

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REAGENT

Triethybromogermane

97%

CAS:1067-10-3

Formula:C₆H₁₅BrGe

MW:239.727 g/mol

฿18,580.00

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