Used primarily as a precursor in chemical vapor deposition (CVD) processes for depositing platinum-containing thin films. These films serve in microelectronics as conductive layers, especially in semiconductor devices and capacitors, due to platinum’s excellent stability and conductivity. The compound’s volatility and thermal decomposition properties make it suitable for forming high-purity platinum films at relatively low temperatures. It is also explored in research for catalytic applications and in the fabrication of nanoscale electronic components.