Used as a precursor in chemical vapor deposition (CVD) processes to produce titanium-containing thin films, particularly titanium oxide layers, which are important in semiconductor and optoelectronic devices. Its volatility and thermal stability make it suitable for depositing high-purity films at relatively low temperatures. Also employed in research for synthesizing titanium-doped materials and as a reducing agent in specialized organic transformations due to the Ti(III) oxidation state.