Used as a precursor in chemical vapor deposition (CVD) processes to produce copper-containing thin films for semiconductor and electronic devices. Its volatility and thermal stability make it suitable for depositing high-purity copper oxide or copper metal layers at relatively low temperatures. Also employed in research for catalytic applications and as a source of copper in the synthesis of nanomaterials. Due to its well-defined structure and solubility in organic solvents, it is utilized in solution-based methods for fabricating functional coatings and advanced materials.