MOCVD Precursors (3)

REAGENT

Tin(II) ethoxide

CAS:14791-99-2

Formula:C₄H₁₀O₂Sn

MW:208.831 g/mol

฿7,980.00

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REAGENT

Tris[N,N-bis(trimethylsilyl)amide]erbium(III)

98%

CAS:103457-72-3

Formula:C₁₈H₅₄ErN₃Si₆

MW:648.413 g/mol

฿29,990.00

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REAGENT

Tris[N,N-bis(trimethylsilyl)amide]lanthanum(III)

97%

CAS:35788-99-9

Formula:C₁₈H₅₄LaN₃Si₆

MW:620.065 g/mol

฿33,950.00

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REAGENT

Ti solution

1000µg/ml,5% HNO3

฿3,300.00

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REAGENT

(Trimethyl)pentamethylcyclopentadienylplatinum(IV)

98%

CAS:97262-98-1

Formula:C₁₄H₃₀Pt

MW:375.41 g/mol

฿25,520.00

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REAGENT

Tris(methylcyclopentadienyl)erbium(III)

98%

CAS:39470-10-5

Formula:C₂₁H₃₉Er

MW:404.62 g/mol

฿4,450.00

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REAGENT

Triethylarsine

99%

CAS:617-75-4

Formula:C₆H₁₆AS

MW:?162.10 g/mol

฿26,250.00

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REAGENT

Tetrakis(dimethylamido)hafnium

99.9999% metals basis

CAS:19782-68-4

Formula:C₈H₂₄HfN₄

MW:354.79 g/mol

฿148,990.00

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REAGENT

Tetra-n-butylgermanium

99%

CAS:1067-42-1

Formula:C₁₆H₃₆Ge

MW:301.05 g/mol

฿1,150.00

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REAGENT

Tetrakis(diethylamino)zirconium

99%

CAS:13801-49-5

Formula:C₁₆H₄₀N₄Zr

MW:379.74 g/mol

฿11,530.00

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