Thin Film Deposition Precursors for Semiconductors (4)

REAGENT

1,5-Cyclooctadiene(hexafluoro-2,4-pentanedionato)copper(I)

95.0%

CAS:86233-74-1

Formula:C₁₃H₁₃CuF₆O₂

MW:378.77 g/mol

฿1,782.00

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REAGENT

Tetrakis(dimethylamino)silane

99%

CAS:1624-01-7

Formula:C₈H₂₄N₄Si

MW:204.40 g/mol

฿6,480.00

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REAGENT

TETRAKIS(TRIMETHYLSILOXY)TITANIUM

97%

CAS:15990-66-6

Formula:C₁₂H₃₆O₄Si₄Ti

MW:404.62 g/mol

฿13,500.00

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REAGENT

Hexachlorodisilane

96%

CAS:13465-77-5

Formula:Cl₆Si₂

MW:268.87 g/mol

฿4,900.00

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REAGENT

octachlorotrisilane

96%

CAS:13596-23-1

Formula:Cl₈Si₃

MW:367.88 g/mol

฿29,980.00

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REAGENT

2,4,6-Trimethyl-2,4,6-trivinylcyclotrisilazane

≥97%

CAS:5505-72-6

Formula:C₉H₂₁N₃Si₃

MW:255.54 g/mol

฿1,680.00

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REAGENT

1,1,3,3-Tetrachloro-1,3-Disilabutane

90%

CAS:148859-49-8

Formula:C₂H₆Cl₄Si₂

MW:228.053 g/mol

฿1,980.00

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REAGENT

1,1,3,3,5,5,7,7-Octamethyl Cyclotetrasilazane

T-95%

CAS:1020-84-4

Formula:C₈H₂₈N₄Si₄

MW:292.68 g/mol

฿940.00

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REAGENT

Tris(hexafluoroacetylacetonato)iron(III)

≥95%(T)

CAS:17786-67-3

Formula:C₁₅H₃F₁₈FeO₆

MW:677.00 g/mol

฿6,320.00

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REAGENT

(1,5-Cyclooctadiene)(hexafluoroacetylacetonato)silver(I)

99%

CAS:38892-25-0

Formula:C₁₃H₁₃AgF₆O₂

MW:423.1 g/mol

฿5,184.00

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