Hexachlorodisilane is primarily used in the semiconductor industry as a precursor for silicon deposition in chemical vapor deposition (CVD) processes. It plays a critical role in the production of silicon-based thin films and coatings, which are essential for manufacturing integrated circuits and other electronic components. Additionally, it is employed in the synthesis of silicon-containing polymers and ceramics, where it serves as a key intermediate. Its ability to form high-purity silicon layers makes it valuable in advanced materials research and development, particularly in creating nanostructures and specialized coatings for optical and electronic applications.