1,1,3,3,5,5,7,7-Octamethyl Cyclotetrasilazane

T-95%

Reagent Code: #88064
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CAS Number 1020-84-4

science Other reagents with same CAS 1020-84-4

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 292.68 g/mol
Formula C₈H₂₈N₄Si₄
badge Registry Numbers
MDL Number MFCD00046123
thermostat Physical Properties
Melting Point 94-99°C (Lit.)
Boiling Point 225°C
inventory_2 Storage & Handling
Storage 2~8℃,Seal

description Product Description

This chemical is primarily utilized in the production of advanced materials, particularly in the field of semiconductors and electronics. It serves as a precursor for depositing silicon nitride thin films, which are essential for insulating layers in microelectronic devices. Its application extends to the fabrication of coatings that enhance the durability and performance of optical components. Additionally, it is employed in the synthesis of silicon-based polymers, contributing to the development of heat-resistant and chemically stable materials. Its role in these high-tech industries underscores its importance in modern manufacturing and material science.

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Test Parameter Specification
Purity (TECH) 94.5-100
Purity (GC) 90-100%
Appearance White powder or crystals

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 1ml
10-20 days ฿940.00
inventory 5ml
10-20 days ฿3,200.00
inventory 25ml
10-20 days ฿12,310.00
inventory 100ml
10-20 days ฿44,600.00

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1,1,3,3,5,5,7,7-Octamethyl Cyclotetrasilazane
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This chemical is primarily utilized in the production of advanced materials, particularly in the field of semiconductors and electronics. It serves as a precursor for depositing silicon nitride thin films, which are essential for insulating layers in microelectronic devices. Its application extends to the fabrication of coatings that enhance the durability and performance of optical components. Additionally, it is employed in the synthesis of silicon-based polymers, contributing to the development of hea

This chemical is primarily utilized in the production of advanced materials, particularly in the field of semiconductors and electronics. It serves as a precursor for depositing silicon nitride thin films, which are essential for insulating layers in microelectronic devices. Its application extends to the fabrication of coatings that enhance the durability and performance of optical components. Additionally, it is employed in the synthesis of silicon-based polymers, contributing to the development of heat-resistant and chemically stable materials. Its role in these high-tech industries underscores its importance in modern manufacturing and material science.

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