This chemical is primarily utilized in the field of materials science, particularly in the deposition of thin films. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, where it helps in the formation of copper-containing films on various substrates. These films are essential in the manufacturing of microelectronic devices, such as integrated circuits and semiconductors, due to copper's excellent electrical conductivity. Additionally, it is employed in the development of advanced coatings and nanomaterials, contributing to innovations in electronics, optics, and catalysis. Its stability and reactivity make it a valuable component in precise and controlled deposition processes.