Used primarily in the semiconductor industry as a precursor for silicon nitride and silicon dioxide thin films in chemical vapor deposition (CVD) processes. It plays a crucial role in the fabrication of microelectronic devices, ensuring high-quality, uniform layers essential for device performance. Additionally, it is employed in the production of optical coatings and as a surface modifier in various advanced materials. Its ability to deposit silicon-based films at relatively low temperatures makes it valuable for applications requiring precise control over film properties.