Used primarily as a photoacid generator (PAG) in photolithography, especially in deep ultraviolet (DUV) and extreme ultraviolet (EUV) resist systems. Upon exposure to radiation, it generates strong Brønsted acids such as H[SbF6], which catalyze chemical transformations in photoresists, enabling precise pattern development in semiconductor manufacturing. Its thermal stability and efficient acid generation make it suitable for high-resolution patterning in microelectronics. Also employed in cationic polymerization processes and specialty coatings where controlled acid initiation is required.