This chemical is primarily used as a precursor in the synthesis of titanium-based thin films and coatings, particularly in the field of chemical vapor deposition (CVD) and atomic layer deposition (ALD). It serves as a key component in the production of advanced materials for semiconductor devices, where precise and high-quality titanium oxide layers are essential. Additionally, it finds application in catalysis, especially in polymerization reactions, where it can enhance the efficiency and control of the process. Its stability and reactivity make it suitable for specialized industrial and research applications requiring high-performance titanium compounds.