Hafnium(IV) acetylacetonate is primarily used in the field of materials science, particularly in the production of thin films and coatings. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, enabling the creation of hafnium oxide layers. These layers are critical in the semiconductor industry for manufacturing high-k dielectric materials, which are essential in advanced electronic devices like transistors and capacitors. Additionally, it finds application in catalysis, where it acts as a catalyst or catalyst precursor in various organic reactions, enhancing efficiency and selectivity. Its role in nanotechnology is also notable, as it contributes to the development of nanostructured materials with tailored properties.