Trimethylgermanium chloride is primarily used in the semiconductor industry as a precursor for the deposition of germanium-containing thin films. These films are essential in the fabrication of advanced electronic devices, such as transistors and solar cells, due to their excellent electrical properties. Additionally, it serves as a key reagent in organometallic chemistry for synthesizing various germanium-based compounds, which are explored for their potential in catalysis and material science. Its role in chemical vapor deposition (CVD) processes is particularly significant, enabling the production of high-purity germanium layers critical for optoelectronic applications.