Used primarily in the chemical vapor deposition (CVD) process to produce thin films of nickel-containing materials, which are essential in the manufacturing of semiconductors and electronic devices. It serves as a precursor for depositing nickel layers that enhance conductivity and corrosion resistance in microelectronic components. Additionally, it is employed in the synthesis of catalysts for organic reactions, particularly in cross-coupling and hydrogenation processes, due to its stability and reactivity. In materials science, it contributes to the development of advanced coatings and nanocomposites with tailored properties for industrial applications.