This chemical is primarily used in the field of materials science, particularly in the deposition of thin films. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create nickel-containing films. These films are essential in the production of electronic components, such as semiconductors and sensors, due to their conductive and catalytic properties. Additionally, it is employed in research and development for creating advanced materials with specific magnetic or electronic characteristics. Its stability and reactivity under controlled conditions make it a valuable compound in nanotechnology and surface coating applications.