Tantalum(V) methoxide
99%(99.99 %-Ta)
Reagent
Code: #61169
CAS Number
865-35-0
blur_circular Chemical Specifications
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Molecular Information
Weight
336.12 g/mol
Formula
C₅H₁₅O₅Ta
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Registry Numbers
MDL Number
MFCD00058817
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Physical Properties
Melting Point
49-51°C
Boiling Point
188-190°C 10mm
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Storage & Handling
Storage
room temperature
description Product Description
Used in the production of thin films for electronic and optical devices, it serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It is also employed in the synthesis of advanced ceramics and coatings, enhancing their thermal and chemical stability. Additionally, it plays a role in catalysis for organic reactions, particularly in polymerization processes. Its application in nanotechnology is significant for creating nanostructured materials with tailored properties.
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