Used as a precursor in chemical vapor deposition (CVD) processes for depositing magnesium-containing thin films, particularly in the development of advanced semiconductor materials and optoelectronic devices. Its high purity and volatility make it suitable for creating uniform, high-quality coatings on substrates. Commonly applied in research and industrial settings where precise control over magnesium doping or compound formation is required, such as in the synthesis of magnesium-doped oxides or nitrides. Also utilized in organometallic synthesis as a strong base or transmetalating agent in controlled reactions.