Used as a precursor in the synthesis of silicon-based polymers and ceramics, particularly in the production of silicon carbonitride materials through pyrolysis. It serves as a key reagent in deposition processes for creating protective coatings and thin films in microelectronics due to its ability to form stable, high-purity layers at relatively low temperatures. Also employed in research for developing novel silazane-based networks with tailored thermal and mechanical properties. Its high reactivity and volatility make it suitable for vapor-phase applications in semiconductor manufacturing and advanced material fabrication.