Used primarily as a precursor in the deposition of silicon-based thin films through chemical vapor deposition (CVD) processes. It is especially valuable in the semiconductor industry for creating high-purity silicon or silicon carbide layers on substrates. Its volatility and thermal stability allow for efficient film formation at relatively low temperatures, making it suitable for advanced microelectronic device fabrication. Additionally, it serves as a reagent in the synthesis of other organosilicon compounds used in specialty polymers and ceramics.