Used primarily as an intermediate in the synthesis of silicon-based compounds, particularly in the production of high-purity silicon films through chemical vapor deposition (CVD). It serves as a precursor in semiconductor manufacturing, where controlled deposition of silicon layers is critical. Its reactivity allows for selective surface reactions, making it valuable in specialized coating applications and nanomaterial fabrication. Due to its sensitivity to moisture and air, handling requires inert conditions, limiting its use to controlled industrial and research environments.