Used as a surface treatment agent in semiconductor manufacturing, particularly in advanced lithography processes. It helps modify silicon-based surfaces to improve adhesion and performance of photoresists. Also employed as a silylating agent in organic synthesis to protect hydroxyl or amine groups during multi-step reactions. Its reactivity with surfaces containing hydroxyl groups makes it valuable in creating hydrophobic coatings and in the preparation of functionalized materials for microelectronics and nanotechnology applications.