Used as a silylating agent in organic synthesis, particularly in the preparation of silicon-containing compounds for semiconductor and thin-film applications. Its reactivity makes it suitable for surface modification of materials in microelectronics and as a precursor in chemical vapor deposition (CVD) processes to form silicon-based dielectric layers. Also employed in the synthesis of advanced silane polymers and hybrid organic-inorganic materials due to its ability to introduce dimethylamino and trimethylsilyl groups under mild conditions.