Used as a surface modifying agent in semiconductor and coating industries, n-Hexylsilane improves hydrophobicity and adhesion properties on silicon-based substrates. It is commonly applied in the fabrication of microelectronic devices, where it helps passivate surfaces and reduce unwanted electrical leakage. Its long alkyl chain provides stable monolayer formation on oxides and metals, making it valuable in self-assembled monolayer (SAM) technology for sensors and nanolithography. Additionally, it serves as a precursor in synthesizing hybrid organic-inorganic materials for specialty coatings with enhanced durability and water resistance.