Tris(i-propylcyclopentadienyl)cerium

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Reagent Code: #129271
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CAS Number 122528-16-9

science Other reagents with same CAS 122528-16-9

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scatter_plot Molecular Information
Weight 461.63 g/mol
Formula C₂₄H₃₃Ce
badge Registry Numbers
MDL Number MFCD00269815
inventory_2 Storage & Handling
Storage 2-8°C, Sealed, Inert Gas

description Product Description

Used as a precursor in chemical vapor deposition (CVD) processes for depositing cerium-containing thin films. These films are applied in catalytic systems, especially in automotive exhaust catalysts and fuel cell components, due to cerium’s redox properties. Also employed in research for synthesizing nanostructured cerium oxides with high surface area, which show enhanced activity in oxidation reactions. Its organometallic structure allows for controlled decomposition at moderate temperatures, making it suitable for low-temperature deposition applications.

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Size Availability Unit Price Quantity
inventory 5g
10-20 days ฿44,000.00
inventory 1g
10-20 days ฿52,810.00

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Tris(i-propylcyclopentadienyl)cerium
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Used as a precursor in chemical vapor deposition (CVD) processes for depositing cerium-containing thin films. These films are applied in catalytic systems, especially in automotive exhaust catalysts and fuel cell components, due to cerium’s redox properties. Also employed in research for synthesizing nanostructured cerium oxides with high surface area, which show enhanced activity in oxidation reactions. Its organometallic structure allows for controlled decomposition at moderate temperatures, making it

Used as a precursor in chemical vapor deposition (CVD) processes for depositing cerium-containing thin films. These films are applied in catalytic systems, especially in automotive exhaust catalysts and fuel cell components, due to cerium’s redox properties. Also employed in research for synthesizing nanostructured cerium oxides with high surface area, which show enhanced activity in oxidation reactions. Its organometallic structure allows for controlled decomposition at moderate temperatures, making it suitable for low-temperature deposition applications.

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