Used primarily as a monomer in the synthesis of specialty polymers, 4-tert-Butoxystyrene contributes to the production of high-performance resins with enhanced thermal stability and solubility. Its bulky tert-butoxy group imparts steric hindrance, which helps control polymer chain packing, making the resulting polymers suitable for advanced lithography applications, including semiconductor manufacturing. It is particularly valuable in the formulation of photoresists for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography due to its favorable etch resistance and ability to form precise patterns at nanoscale dimensions. Additionally, it serves as an intermediate in the development of functional materials for optoelectronics and sensors.