This compound is primarily utilized in the field of organic synthesis, particularly in the development of photolabile protecting groups. Its structure allows it to act as a photosensitive moiety, enabling controlled release of functional groups upon exposure to light. This property is valuable in photochemistry and material science, where precise spatial and temporal control over chemical reactions is required. Additionally, it finds applications in the synthesis of advanced polymers and coatings, where light-induced modifications are necessary for specific performance characteristics. Its unique spirocyclic and benzophenone components contribute to its stability and reactivity under photochemical conditions.