This chemical is primarily utilized in the field of organic synthesis, particularly in the development of photoresist materials. Its unique structure makes it suitable for use in lithography processes, where it acts as a photoactive compound. When exposed to ultraviolet light, it undergoes a photochemical reaction that alters its solubility, enabling the creation of precise patterns on semiconductor wafers. This property is critical in the manufacturing of microelectronic devices, such as integrated circuits and microchips. Additionally, its spirocyclic component contributes to enhanced stability and performance under various processing conditions, making it a valuable component in advanced material formulations.