This chemical is primarily utilized in the field of organic synthesis, particularly in the development of photoresist materials for the semiconductor industry. Its structure, featuring a benzophenone moiety and a spiro acetal substituent, makes it effective in UV light absorption, which is crucial for photolithography processes. The compound is also explored in the design of advanced polymers and coatings, where its stability and light-sensitive properties enhance performance. Additionally, it finds potential applications in the synthesis of pharmaceuticals, where its unique structure can contribute to the creation of biologically active molecules.