Used as a key intermediate in the synthesis of triarylsulfonium salts, which serve as photoacid generators in advanced photolithography processes. Widely applied in semiconductor manufacturing and microelectronics for patterning high-resolution features on wafers. Also utilized in specialty polymer formulations to initiate cationic polymerization upon exposure to UV light, making it valuable in coatings, inks, and adhesives that require rapid curing. Its thermal stability and efficient acid generation profile make it suitable for high-performance imaging systems.