Used as a highly efficient photoacid generator in advanced photolithography processes, particularly in semiconductor manufacturing. Upon exposure to deep UV or EUV light, it releases strong protic acids that catalyze chemical transformations in photoresists, enabling precise patterning of microelectronic circuits. Also employed in cationic polymerization reactions, where it initiates the curing of epoxies and vinyl ethers under light exposure, making it valuable in coatings, inks, and adhesives. Its thermal stability and high acid strength upon activation make it suitable for high-performance imaging systems and specialty polymer synthesis.