This chemical is primarily used as a photoacid generator (PAG) in the field of photolithography, particularly in the manufacturing of semiconductors and microelectronics. When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the chemical reactions necessary for patterning photoresists on silicon wafers. Its high efficiency and stability under UV exposure make it a valuable component in advanced lithographic processes, enabling the production of smaller and more precise electronic components. Additionally, it finds application in the development of high-resolution imaging materials and advanced coatings where controlled acid generation is required.