Triphenylsulfonium bromide is widely used as a photoacid generator in photolithography processes, particularly in the semiconductor and electronics industries. It plays a critical role in the production of microchips and integrated circuits by generating acids upon exposure to ultraviolet light, which helps in patterning and etching silicon wafers. Additionally, it is employed in the synthesis of advanced materials, such as photoresists, due to its ability to initiate cross-linking or decomposition reactions under light exposure. Its application extends to research and development in organic chemistry, where it serves as a reagent for various catalytic and synthetic processes.