Triarylsulfonium hexafluoroantimonate salts are widely used as photoacid generators in photolithography processes, particularly in the semiconductor and electronics industries. They play a critical role in the production of microchips and integrated circuits by generating strong acids upon exposure to ultraviolet (UV) light, which helps in patterning and etching silicon wafers. These salts are also employed in the manufacturing of printed circuit boards (PCBs) to create precise and high-resolution patterns. Additionally, they are utilized in advanced coatings and adhesives that require UV curing, ensuring rapid and efficient polymerization. Their stability and efficiency make them essential in applications demanding high-performance photochemical reactions.