This chemical is primarily used as a photoacid generator (PAG) in photolithography processes, particularly in the manufacturing of semiconductors and microelectronics. When exposed to ultraviolet (UV) light, it releases acid, which helps in the patterning of photoresists on silicon wafers. This enables the precise etching and layering required for creating integrated circuits and other electronic components. Additionally, it finds application in advanced materials science for developing high-resolution imaging and patterning in nanofabrication. Its stability and efficiency in generating acid make it a valuable component in industries focused on precision and miniaturization.