Used primarily as a highly effective photoacid generator (PAG) in photolithography processes within the semiconductor industry. It plays a critical role in the production of microelectronic devices by generating acid upon exposure to ultraviolet (UV) light, which helps in patterning and etching silicon wafers with high precision. Its trifluoromethyl group enhances its stability and reactivity, making it suitable for advanced lithography techniques, including deep UV and extreme UV lithography. Additionally, it is employed in the synthesis of specialty chemicals and as a catalyst in organic reactions due to its strong acidic properties.