Widely used as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. It plays a critical role in photolithography processes, where it generates strong acids upon exposure to UV light, facilitating the patterning of silicon wafers. Its thermal stability and efficiency make it suitable for advanced lithography techniques, including deep UV and extreme UV (EUV) lithography. Additionally, it is employed in the synthesis of specialty chemicals and polymers, where it acts as a catalyst or initiator in cationic polymerization reactions. Its high reactivity and compatibility with various substrates make it valuable in creating high-performance materials for electronics and coatings.