This compound is primarily utilized in photolithography processes within the semiconductor industry. It serves as a photoacid generator (PAG), which is critical for creating precise patterns on silicon wafers during the manufacturing of microchips. Upon exposure to UV light, it releases strong acids that catalyze the chemical reactions needed to develop the desired circuit patterns. Its stability and efficiency in generating acids make it a valuable component in advanced photoresist formulations, enabling the production of high-resolution and miniaturized electronic components. Additionally, it finds use in polymer chemistry for initiating cationic polymerization reactions, contributing to the synthesis of specialized polymeric materials.