This chemical is primarily utilized in the field of photolithography, particularly in the production of semiconductors and microelectronic devices. It acts as a photoacid generator (PAG), which is crucial in the photoresist process. When exposed to ultraviolet (UV) light, it releases acid, facilitating the patterning of photoresist materials on silicon wafers. This enables the precise etching and deposition required for creating intricate circuit designs. Additionally, it finds application in advanced material synthesis, where it is used to initiate polymerization reactions under light exposure, contributing to the development of specialized coatings and polymers. Its role in generating reactive species under controlled conditions makes it valuable in research and industrial processes requiring high precision and efficiency.