This chemical is primarily used as a photoacid generator (PAG) in various photolithography processes, especially in the manufacturing of semiconductors and microelectronics. When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the cross-linking or deprotection of polymers, enabling precise patterning on silicon wafers. Its efficiency and stability make it suitable for advanced photoresist formulations, contributing to the production of high-resolution electronic components. Additionally, it finds application in the development of advanced materials and coatings where controlled acid generation is required for curing or modification processes.