This chemical is primarily used as a photoacid generator (PAG) in photolithography processes, particularly in the production of semiconductors and microelectronics. It plays a crucial role in creating high-resolution patterns on silicon wafers by generating acids upon exposure to ultraviolet (UV) light. These acids catalyze the chemical reactions needed to develop the desired patterns on photoresist materials. Additionally, it is employed in advanced polymer synthesis and surface modification techniques, where controlled acid generation is essential for precise material structuring. Its stability and efficiency make it a valuable component in cutting-edge manufacturing technologies.