This compound is primarily utilized in the field of photopolymerization, where it serves as a highly efficient photoacid generator (PAG). Upon exposure to ultraviolet (UV) light, it releases strong acids that initiate the polymerization process, making it valuable in the production of advanced coatings, adhesives, and photoresists. Its ability to generate acids under UV light is particularly beneficial in the fabrication of microelectronics, where precise patterning and high-resolution imaging are required. Additionally, it is employed in the development of optical materials and in the synthesis of specialty polymers, where controlled acid generation is essential for achieving desired material properties.