This chemical is primarily utilized as a photoacid generator (PAG) in various photolithography processes, particularly in the manufacturing of semiconductors and microelectronics. When exposed to ultraviolet (UV) light, it releases acid, which is essential for patterning and developing photoresist materials on silicon wafers. Its stability and efficiency under UV exposure make it suitable for high-resolution imaging in advanced technology nodes. Additionally, it finds application in the synthesis of specialty polymers and coatings, where controlled acid generation is required for curing or cross-linking processes.