This chemical is widely used as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. It plays a critical role in the lithography process, where it generates strong acids upon exposure to ultraviolet (UV) light, enabling the precise patterning of microelectronic components. Its high efficiency and stability make it suitable for advanced node technologies, including extreme ultraviolet (EUV) lithography. Additionally, it is utilized in the production of high-performance coatings and materials that require controlled acid-catalyzed reactions. Its unique properties also make it valuable in research and development for creating specialized polymers and advanced chemical systems.