It is primarily used as a photoacid generator (PAG) in advanced photoresist formulations for semiconductor manufacturing. The chemical releases strong acids upon exposure to ultraviolet (UV) light, enabling precise patterning of microelectronic components during lithography processes. Its high efficiency and stability make it suitable for producing high-resolution features in integrated circuits and other nanoscale devices. Additionally, it finds application in the development of advanced materials, such as functional coatings and polymers, where controlled acid generation is required for specific chemical modifications or curing processes. Its compatibility with various substrates and its ability to operate under demanding conditions contribute to its utility in cutting-edge technology applications.