This chemical is widely used in the field of organic synthesis, particularly as a highly effective photoacid generator (PAG). It plays a crucial role in photolithography processes, especially in the manufacturing of semiconductors and microelectronics, where it helps in creating precise patterns on silicon wafers. Its ability to generate strong acids upon exposure to light makes it valuable in advanced photoresist formulations. Additionally, it is utilized in surface modification and coating applications, enhancing the properties of materials such as water repellency and chemical resistance. Its unique structure also makes it suitable for research in fluorinated compounds and their specialized applications.