Used as a key reagent in photopolymerization processes, particularly in the production of high-resolution imaging materials. It acts as a photoacid generator, releasing strong acids upon exposure to UV light, which initiates the polymerization of monomers. This makes it valuable in the manufacturing of advanced photoresists for microelectronics and semiconductor industries. Additionally, it is employed in the development of coatings, adhesives, and inks that require precise curing under light exposure. Its efficiency in generating reactive species under controlled conditions also makes it suitable for research in organic synthesis and material science.